발행물
컨퍼런스
The Korean Society of Semiconductor & Display Technology
2023
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Effect of Colloidal Silica and Molybdenum Ions on PVA Brush Loading during Mo Post-CMP Cleaning
Korean International Semiconductor Conference on Manufacturing Technology 2023
A Novel Method to Evaluate the Contact Area of PVA Brushes during Post-CMP Cleaning
Investigation of Surface Chemistry of 4H-SiC during RCA Cleaning Processes
Characterization of Alkaline Cu/Ti Slurry for TSV Chemical Mechanical Planarization
Effect of Organic Amine on Ceria Contamination for Nitride Surface During STI CMP