발행물
컨퍼런스
SYMPOSIUM ON ULTRA CLEAN PROCESSING OF SEMICONDUCTOR SURFACES 2023
2023
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Pinpoint particle removal for EUV Pellicle Productivity Enhancement
Investigation of Selective Wet Etching of SiGe Substrates for High-Performance Device Manufacturing
SPIE Advanced Lithography and Patterning
Selective removal of EUV-exposed particles from pellicle
241st Electrochemical Society Meeting
2022
Characterization of Wetting Behavior on High Aspect Ratio Multilayer Structure
The Surface Preparation and Cleaning Conference
2021
An Analysis Method of the Wetting Characteristic of High Aspect Ratio Structure