발행물
컨퍼런스
2020년도 한국 재료학회 춘,추계통합학술대회
2020
,
DHF을 사용한 Brush scrubbing에 발생하는 PVA brush의 변화 연구
Effect of particle Agglomeration by Air bubble during Tungsten (W) CMP Process
THE SURFACE PREPARATION AND CLEANING CONFERENCE
Mechanisms of Colloidal Ceria Contamination and Cleaning during Oxide Post-CMP
Study on PVA Brush Particle Loading during Post CMP Cleaning
China Semiconductor Technology International Conference
Sidewall characterization and 3D-AFM applications