발행물
컨퍼런스
Materials Research Society (MRS) 2025 spring
2011
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Thermal budget analysis of ferroelectric ALD-(Hf,Zr)O2 thin films using the JMAK model
Influence of W and TiN electrodes on ferroelectric ALD-(Hf,Zr)O2 capacitors at cryogenic temperatures
The Korean Conference on Semiconductors (KCS) 2025
2014
A study on low-thermal-budget (300℃) process of ferroelectric (Hf,Zr)O2 thin films using HPA and furnace
A study on the capping layer effect depending on oxygen source in ferroelectric (Hf,Zr)O2 thin films
Comparison of ferroelectric properties of W/HZO/W and TiN/HZO/TiN capacitors at cryogenic temperatures