발행물
컨퍼런스
IEEE Symposium on VLSI Technology and Circuits 2024
2020
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BEOL compatible ultra-low operating voltage (0.5 V) and preconfigured switching polarization states in effective 3 nm ferroelectric HZO capacitors
The Korean Conference on Semiconductors (KCS) 2024
2026
Analysis of hydrogen effect on ferroelectric (Hf,Zr)O2 thin films during atomic layer deposition process
A study on low-temperature (<400°C) furnace annealing for BEOL compatible ferroelectric ALD-(Hf,Zr)O2 thin films
Comparative study on ferroelectric properties of (Hf,Zr)O2 thin films using H2O2 and O3 as ALD oxidants
Investigation of ferroelectric properties of ALD-(Hf,Zr)O2 thin films from cryogenic to room temperatures