발행물
컨퍼런스
ECS 2012
2012
,
Channel Strain Evolution of Recessed Source/Drain Si1-xCx Structures by Modifying Scaling Factors
Strain Evolution of Si1-xGex Selective Epitaxial Growth in Steps
European Microscopy Congress 2012
Characterization of channel strain evolution of recessed source/drain Si1-xCx structures by nano beam diffraction
Strain behaviors of epitaxial Si1-xCx films on silicon during dry oxidation
ENGE2012
The Effect of Source/Drain Length on Channel Strain of Recessed Source/Drain Si1-xCx Structures