발행물
컨퍼런스
International Union of Materials Research Societies-International Conference in Asia 2012
2012
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Strain Behaviors od Epitaxial Si1-xCx Films on Si during Dry Oxidation
Size and shape effect of SiC source/drain to strained Si
Strain Evolution of Si1-xGex Selective Epitaxail Growth in Steps
Comparison of Erbium Silicide Formation on N-Type Si(100) and Si1-xCx Epitaxial Layer
Effect of Top electrode material and Compliance Current on Resistive Switching properties of HfOx Film Memory Devices