The Effects of Postannealing Treatment in Forming Gas on Low-k SiOC(H) Film
박상한, 김효진, 조만호, 고대홍, 손현철, Hahn, JH (Hahn, J. H.), Lee, DH (Lee, D. -H.), Kwon, YS (Kwon, Y. S.), Park, SY (Park, S. -Y.), Kim, MS (Kim, M. -S.)
Journal of The Electrochemical Society, 2010