The dielectric characteristics and thermal stability of Hf-silicate films with different Si contents

Growth kinetics of atomic layer deposited Hf silicate-like films using Hf[N (CH3) (C

A study on the thermal stabilities of the NiGe and Ni1-xTaxGe systems

Effects of N-2(+) ion implantation on phase transition in Ge2Sb2Te5 films

Change in phase separation and electronic structure of nitrided Hf-silicate films as a function of composition and post-nitridation anneal

Formation of a Ge-rich layer during the oxidation of strained Si1-xGex

Nitridation for HfO2 high-k films on Si by an NH3 annealing treatment

Phase separation of a Ge2Sb2Te5 alloy in the transition from an amorphous structure to crystalline structures

Change in depth profile of N highly incorporated into SiO2 by plasma-assisted nitridation

Structural and stoichiometric change in nitrided HfO2 grown on Ge(100) by atomic layer deposition