발행물

전체 논문

248

161

The microstructure and chemical state of W-Si-N layers formed in W/WNx/poly-Si systems during postannealing
Kang, SK, Min, BG, 고대홍, Kang, HB, Yang, CW, Lim, KY
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2004

162

Investigation of Ge profile on SiGe islands by scanning photoelectron microscopy
조만호, Cho Y.J., Lee M.K., Park S.A., Roh Y.S., Kim Y.K., 정광호, Kang S.K., 고대홍, Shin H.J., Kwon K.W.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004

163

Evolution of tungsten-oxide whiskers synthesized by a rapid thermal-annealing treatment
조만호, Park S.A., Yang K.-D., 여인환, 정광호, Kang S.K., 고대홍, Kwon K.W., Ku J.H., Choi S.Y., Shin H.J.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004

164

Interfacial characteristics of HfO2 films grown on strained Si0.7Ge0.3 by atomic-layer deposition
조만호, Chang, HS, 문대원, Kang, SK, Min, BK, 고대홍, Kim, HS, McIntyre, PC, Lee, JH, Ku, JH, Lee, NI
APPLIED PHYSICS LETTERS, 2004

165

Physical and electrical properties of W/MN
Kang S.-K., Min B.G., Kim J.J., 고대홍, Kang H.B., Yang C.W., Lim K.Y., Ahn T.H.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2004

166

Change in the chemical state and thermal stability of HfO2 by the incorporation of Al2O3
조만호, Chang HS, Cho YJ, Moon DW, Min KH, Sinclair R, Kang SK, 고대홍, Lee JH, Gu JH, Lee NI
APPLIED PHYSICS LETTERS, 2004

167

Investigation of the chemical state of ultrathin Hf-Al-O films during high temperature annealing
조만호, Chang H.S., Cho Y.J., 문대원, Min K.-H., Sinclair R., Kang S.K., 고대홍, Lee J.H., Gu J.H., Lee N.I.
SURFACE SCIENCE, 2004

168

Interfacial reactions between WNx and poly Si1-xGex films
Kang, SK, Min, BG, Kim, JJ, 고대홍, Kang, HB, Yang, CW, 조만호
JOURNAL OF APPLIED PHYSICS, 2003

169

Characteristice of ZrO2 Films with Al and Pt Gate Electrodes
고대홍
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2003

170

Evaluation of the electrical properties and interfacial reactions for the polycrystalline Si1-xGex(x=0,0.6)/HfO2 gate stack
Kang SK, Nam S, Min BG, Nam SW, 고대홍, 조만호
APPLIED PHYSICS LETTERS, 2003