N-type dopant activation behaviors in poly Si1-xGex films with Ge contents and activation temperatures

Properties of polycrystalline Si1-xGex films grown by ultrahigh vacuum CVD using Si2H6 and GeH4

Effect of deposition conditions of poly Si1-xGex films and Ge atoms on the electrical properties of poly Si1-xGex (x=0,0.6)/HfO2 gate stack

Interfacial Reaction in Poly Si1-xGex/ZrO2 with Ge Content in Poly Si1-xGex films

HIGH PERFORMANCE PMOSFET WITH BF3 PLASMA DOPEDGATE/SOURCE/DRAIN AND S/D EXTENSION

GATE OXIDE RELIABILITY IN MOS STRUCTURES WITH TI-POLYCIDE GATES

EFFECTS OF SURFACE IRON ON PHOTOCONDUCTIVITY CARRIER RECOMBINATION LIFETIME OF P-TYPE SILICON

CHARACTERISTICS OF PECVD GROWN TUNGSTEN NITRIDE FILMS AS DIFFUSION BARRIER LAYERS FOR ULSI DRAM APPL

Microstructure and mechanical properties of WC-C nanocomposite films

Dielectric Characteristrics of Al2O3-HfO2 nanolaminates on Si(100)