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181
Thermal Stability and Structural Characteristics of HfO2 films on Si(100) Grown by Atomic-layer Deposition
황정남, 정광호, 고대홍, 조만호
APPLIED PHYSICS LETTERS, 2002
182
Influence of annealing condition on the properties of sputterd hafnium oxide
고대홍
JOURNAL OF NON-CRYSTALLINE SOLIDS, 2002
183
Growth of epitaxial gamma-Al2O3(111) films using an oxidized Si(111) substrate
황정남, 정광호, 고대홍, 염한웅
JOURNAL OF MATERIALS CHEMISTRY, 2002
184
IMPROVEMENT IN FILM QUALITIES OF SPUTTERED HAFNIUM OXIDE
고대홍
Journal of Non-Crystaline Soilds, 2002
185
YSi2-x formation in the presence of interfacial SiO2 layer
조만호, 고대홍, Y.G. Choi, 여인환, 정광호, 황정남
JOURNAL OF APPLIED PHYSICS, 2002
186
Epitaxial Y2O3 film growth on an oxidized Si surface
조만호, 고대홍, Y.K. Choi, 여인환, 정광호, 황정남
THIN SOLID FILMS, 2002
187
Dielectric characteristics of Al2O3-HfO2 nanolaminates on Si(100)
조만호, Y.S. Roh, 황정남, 정광호, H.J. Choi, S.W.Nam, 고대홍, J.H.Lee, L.I.Lee, K.Fujihara
APPLIED PHYSICS LETTERS, 2002
188
Annealing effects of aluminum silicate films grown on Si(100)
조만호, 노용석, 고대홍, I.W.Lyo, 황정남, K. Jeong
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2002
189
Characteristics of Zirconium Oxide with Different Gate Electrodes
고대홍
Am Vac Soc, 2001
190
Wet oxidation behaviors of polycrystalline Si1-xGex
고대홍
J Vac Sci & Tech, 2001
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