발행물
컨퍼런스
제 26회 한국반도체학술대회
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Atomic layer deposition of ultrathin metal film using discrete feeding method (DFM) and electric field-assisted ALD (EA-ALD)
Novel field-effect passivation for nanostructured black Si solar cells using interfacial sulfur incorporation
Atomic Craft and Interfaces Workshop
Ultrathin (? 5 nm) and Uniform Ru Film Growth Using ALD with Discrete Feeding Method and Electric Field-assisted ALD
Wafer-scale MoS2 monolayer growth on SiO2 substrate by modified atomic layer deposition technique
Atomic Craft and Interfaces Workshop_박태주
New-type field-effect transistors using two-dimensional electron gas in atomic-layer-deposited Al2O3/TiO2 ultrathin (?10 nm) film heterostructure