발행물
컨퍼런스
ALD/ALE 2018
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Efficient photoelectrochemical H2 generation using molybdenum disulfide film on Black Si photocathode via wafer-scale atomic layer deposition
Field-effect Transistor using Two-dimensional Electron Gas in ALD Al2O3/TiO2 Ultrathin (?10 nm) Film Heterostructure Interface
Multifunctional ultrathin coating layers on nanoparticles via atomic layer deposition
Remote Plasma Enhanced-atomic Layer Deposition of SiON Thin Films with a High Growth Rate (? 0.25 nm/cycle) using Novel Si Precursor
Atomic Layer Deposition: A Few Prospective Applications Aiming Mass-production after Current Si-based Semiconductor Proces