,

Field-effect transistors using two-dimensional electron gas in ultrathin film heterostructure interface

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원자층 증착법을 이용한 SiO2/4H-SiC 금속 절연막 반도체

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Interfacial sulfur incorporation for Novel Field-Effect Passivation of nanostructured black Si solar cells

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Wafer-scale monolayer MoS2 growth on SiO2 substrate using modified atomic layer deposition technique

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New class of field-effect transistor with two-dimensional electron gas using atomic-layer-deposited Al2O3/TiO2 ultrathin (?10 nm) film heterostructure