발행물
컨퍼런스
ENGE 2018
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ATOMIC LAYER DEPOSITION : A few prospective applications aiming mass-production after current Si-based semiconductor process
Controlled wafer-scale MoS2 monolayer growth on SiO2 substrate by modified atomic layer deposition technique
Nanopia 2018
Porous Nickel Oxide Driven Highly Sensitive Non-Enzymatic Lactate Biosensor
INPEC 2018
ATOMIC LAYER DEPOSITION: Beyond Semiconductor Process
Enhanced photoelectrochemical hydrogen evolution reaction by atomic-layer-deposited amorphous MoSx on black Si photocathodes