발행물
컨퍼런스
PACRIM-CMP2005
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NONLINEAR DEPENDENCY OF REMOVAL RATE ON PRESSURE AND VELOCITY IN CMP
The First International Conference on Precision Engineering and Micro/Nano Technology in Asia
The Characteristics of Frictional Behavior in CMP Using Integrated Monitoring System
10th international conference of chemical-mechanical-planarization for ULSI multilevel interconnection conference
Friction Force Monitoring System in CMP Process
PACRIM-CMP2004
The effect of pad grooving on CMP performance
Effect of Abrasives concentration and size in ILD chemical mechanical polishing