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Impedance Measurement of SiC Using Multi-Frequency Analysis for Real-Time Control of the Focus Ring in Plasma Processing

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Development of high ion density and uniformity plasma source for large scale descum processing

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그리드를 이용한 Ultra-low electron temperature 플라즈마 생성 및 전자 빔의 제어에 관한 연구

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A study on the measurement of focus ring thickness in the inductively coupled plasma

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산소 플라즈마 전자 빔을 이용한 Photoresist etching