,

Improvement of spatial distribution measurement of plasma parameters through asymmetric double Langmuir probe

,

Enhancement of photoresist etching by controlling the impedance between bias electrode and ground in an inductively coupled plasma

,

Modeling of electron temperature and electron density in ultra-low electron temperature

,

Electron-assisted PR etching in an inductivley coupled oxygen plasma via low-energy electron beam

,

A study on MoS2 etching using ultra-low electron temperature plasma