발행물
컨퍼런스
SEMATECH Surface Preparation and Cleaning Conference
2008
,
Effect of Shockwave on Particle Adhesion Force on Multilayer EUVL Mask
MRS
Dispersion Stability and Polighing Behavior of Ru CMP Slurry by Additives
MNC
2007
Damage Free Particle Removal from EUVL Mask Layers by High Energy Laser Shock Cleaning
Fabrication of Stainless Steel Mold using Electero Chemical Fabrication (ECF) method for Microfluidic Biochip
한국재료학회 추계발표
Poly Si Wafer의 표면 특성변화에 따른 CMP 공정 후 오염 Mechanism의 규명