발행물
컨퍼런스
The Electrochemical Soc.
1994
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Effects of Drying Methods on the Formation of Water Marks in Semiconductor Processing
Proceeding of ElectrochemicalSociety
1992
Wettability of Silicon Waters in CholineSolutions
Proceeding of Microcontanination
Interfacial characteristics of silicon in IPA-water solution and their significance in particle removal