발행물
컨퍼런스
The electrochemical societysoftbound proceeding
1996
,
The application of ozonated DI water tothe pregate oxidation wet cleaning forthe prevention of water marks
Proceeding of the IUMRS 3rdinternational conference
1995
The formation and prevention of water marks in HF last wet cleaning processes
한국재료학회지
1994
반도체 공정중 연속적인 SC1-산화-HF에칭과정이 실리콘 표면에 미치는 영향
반도체 습식공정에서의 미세오염 조절
Proceeding of ElectrochemicalSociety
Effect of Drying Methods and Wettabilityof silicon on the formation of water works in semiconductor processing