발행물
컨퍼런스
The International Conference on Electronic Materials and Nanotechnology for Green Environment (ENGE) 2022
2009
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A study on ferroelectric properties of furnace-annealed Hf0.5Zr0.5O2 films
Atomic Layer Deposition (ALD) 2022
2029
In-situ half-cycle study of high purity H2O2-based HfO2 atomic layer deposition for Hf based ferroelectric devices applications
Scaling down to sub-5 nm ferroelectric Hf0.5Zr0.5O2 thin films with anhydrous H2O2 ALD oxidant
The Korean Institute of Electrical and Electronic Material Engineers (KIEEME) 2022
2024
Effect of ramp rate during furnace annealing on ferroelectric Hf0.5Zr0.5O2 thin films
Furnace annealing effect on ferroelectric Hf0.5Zr0.5O2 thin films