발행물
컨퍼런스
2012 International Conference on Planarization/CMP Technology
2012
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Correlation of Polishing Pad Properties and Pad Debris on Scratch Formation during CMP
Evaluation of Glass Lapping using Fixed Abrasive Pad
The 16th Cleaning Technology Symposium of Korea SCUGM
Review on 11th UCPSS Symposium 2012
Evaluation of very dilute alkaline solutions for wafer cleaning with megasonic irradiation
9th International Conference on Flow Dynamics
Experimental and Theoretical Investigation of Acoustic Cavitation Behavior in the Megasonic Cleaning