발행물
컨퍼런스
2011 Material Research Society Fall Meeting
2011
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PDMS-assisted High Aspect Ratio 60 nm Large-area Metal Mold Fabrication for Nanoimprint Lithography
The 14th Cleaning Technology Symposium of Korea SCUGM
Post Cu CMP Cleaning : TMAH Based Solution
제23차 방사광이용자연구발표회 및 협회정기총회
Effective high dense carbon contaminant removal condition with megasonic hybrid ozone gas dissolved water for Ru capped EUV mask
2011 International Conference on Planarization/CMP Technology
Effect of Oxide Types on Defects in ILD CMP
Blank Mask Fabrication by Chemical Mechanical Polishing of Quartz Substrate Based on Ceria Slurry for Lithography Process