발행물
컨퍼런스
The Symposium on Ultra Clean Processing of Semiconductor Surfaces 2018 (UCPSS 2021)
2021
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Effect of dissolved oxygen on BTA removal from Co during post-Co CMP cleaning
Effect of surfactant in gas dissolved cleaning solutions on acoustic bubble dynamics
Mechanism of PVA Brush Loading with Ceria Particles during Post-CMP Cleaning Process
Formulation and Evaluation of Diluted Sulfuric-Peroxide-HF (DSP+) Mixtures for Cleaning High-Aspect Ratio Contacts in 3D NAND
The Effect of Thermal Aging on Nanoparticle Removal