발행물
컨퍼런스
2019년도 한국 재료학회 추계학술대회
2019
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Quantitative comparison of silica and ceria abrasive contamination on PVA brush and its effect on post CMP cleaning process
Investigation of Corrosion Inhibitor Related Particle Contamination on Post Cu CMP Surface
Mechanistic Study of Different Cleaning Methods to Remove Ceria Particles from Silicon Oxide Surface
236th ElectroChemical Society Meeting
The Adhesion and Removal Mechanism of Ceria Particles for STI Post-CMP Cleaning Process
2019 International Conference on Planarization/CMP Technology
Passivation Control of Co Surface for CMP and Post-CMP Cleaning