발행물
컨퍼런스
Materials Research Society of Korea, Spring Conference, 2022
2022
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Investigation of Wettability in High Aspect Ratio Structures with AFM
Metals ions and colloidal silica induced defects during post-Cu CMP cleaning
36th SCUGM Cleaning Technology Symposium (ICC)
Investigation of Ceria-oxide and Ceria-brush interactions leading to post-CMP cleaning issues
Asian Workshop on Planarization/CMP Technology
2021
Study on the effect of copper ions on brush loading during post-Cu-CMP cleaning
Study of ceria penetration inside the PVA brush during post-CMP cleaning process