발행물
컨퍼런스
2018 International Conference on Planarization/CMP Technology
2018
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Role of Slurry Bubble Formation on the Generation of Defects during W CMP Process
The Passivation Stability of Corrosion Inhibitors on the Surface of Cobalt for Sub 10 nm Device Application
International Union of Materials Research Societies ? International Conference on Electronic Materials 2018 (IUMRS-ICEM 2018)
Characterization of Cu-Inhibitor Complex Layer with AFM and Microfluidics Chip System
Diluted HF cleaning process for metal contamination removal from silicon wafer
Improvement of Wear Resistance of CVD Diamond Films on WC-Co Alloy