발행물
컨퍼런스
2013년도 한국재료학회 춘계학술대회 및 제25회 신소재 심포지엄
2013
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Development of Non-Amine-based Cleaning Solution for Post-Cu CMP Application
The Evaluation of Ceria Slurry for Blank Mask Polishing for Photo-lithography Process
2013 International Conference on Planarization/CMP Technology
Characterization of Sapphire Lapping Process Using Cu-resin Platen with Diamond Slurry
Effects of Sodium Hexamethaphosphate (SHP) on the Ceria Abrasive Particle Dispersion for Quartz CMP
The 18th Cleaning Technology Symposium of Korea SCUGM
Quantitative Control of Cavitation Intensity by Change of Acoustic Bubble Growth Rate