발행물
컨퍼런스
EIPBN
2005
,
Wafer level Hot Embossing of Device patterns on PMMA wafer
한국재료학회
Cu CMP 공정 중의 연마입자 부착력과 마찰력 특성 평가
Removal of Particles and Metal Impurities by adding of Chelating Agent onto SC1 Cleaning Solution in Semiconductor Wet Cleanging Process
Fabrication of stamps using the high temperature epoxy resins for hot embossing
Effect of Corrosion Inhibitor(BTA) on Citric Acid based Slurry on Cu CMP