Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents
박진구
COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS, 2018
32
Effect of organic acids in dilute HF solutions on removal of metal contaminants on silicon wafer
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MICROELECTRONIC ENGINEERING, 2018
33
Removal of CrN Contamination from EUV Mask Backside using Dry Cleaning
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Solid State Phenomena, 2018
34
Conductive and transparent submicron polymer lens array fabrication for electrowetting applications
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JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, 2018
35
Fabrication of high performance copper-resin lapping plate for sapphire: A combined 2-body and 3-body diamond abrasive wear on sapphire
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TRIBOLOGY INTERNATIONAL, 2018
36
Adhesion and removal behavior of particulate contaminants from EUV mask materials
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COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS, 2017
37
Influence of a wrinkle in terms of critical dimension variation caused by transmission nonuniformity and a particle defect on extreme ultraviolet pellicle
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Journal of Micro/ Nanolithography, MEMS, and MOEMS, 2017
38
Modification of DHF for removal of metals from silicon wafer
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ECS Transactions, 2017
39
Characterization of Ammonium Silicate Residue during Polysilazane (PSZ) Dry Etching in NF3/ H2O Gas Chemistry
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ECS Transactions, 2017
40
A Novel Cleaning Approach to Remove the Carbon Contaminant from Ru surface of EUV Mask