Effect of Particle Contamination on Extreme Ultraviolet (EUV) Mask and Megasonic Cleaning Process for Its Removal

Submicron Particle Removal during FPD Oxide TFT Process

Prevention of Metal Contamination in Sub 50 nm SC1 Cleaning Process

Removal of Nano-sized Particles Using Carbon Dioxide (CO2) Gas Cluster Cleaning without Pattern Damage

Dimensionally controlled complex 3D sub-micron pattern fabrication by single step dual diffuser lithography (DDL)

Comparison between sapphire lapping processes using 2-body and 3-body modes as a function of diamond abrasive size

Mechanical deflection of a free-standing pellicle for extreme ultraviolet lithography

Impact of the non-uniform intensity distribution caused by a meshed pellicle of extreme ultraviolet lithography

Multi-Stack Extreme-Ultraviolet Pellicle with Out-of-Band Reduction

Large-Scale Plasma Patterning of Transparent Graphene Electrode on Flexible Substrates