발행물
컨퍼런스
ICPT 2024
2024
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Influence of Deposition Technique (ALD vs. PVD) on Surface Properties of Mo during Post-CMP Cleaning
Effect of Sugar Alcohols on Silicon Oxide and Silicon Nitride Removal Rate as a Function of Carbon Number in STI CMP
Investigation of the root cause of the scratch formation during copper post-CMP brush scrubbing
Investigation of Silica particle and Mo ion contamination on PVA brush during Mo post-CMP cleaning process
PRiME 2024
Study of Physical Cleaning Technologies for Better Particle Removal Trapped on the Crystal Defects of 4H-SiC