발행물
컨퍼런스
ICPT 2023
2023
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A novel approach for PVA brush evaluation by contact area analysis during metal and oxide post-CMP cleaning
Effect of Cleaning Chemicals on Defects of PVA Brush during Post-CMP Cleaning
77th Korea CMPUGM Technical Meeting
Ti ion contamination and removal mechanism during the W CMP process
SPIE Advanced lithography + Patterning 2023
Selective removal of EUV-exposed particles from pellicle
KoSSA
2022
EUV 펠리클 세정을 위한 무손상 pinpoint 입자 제거