발행물
컨퍼런스
2022 International Conference on Planarization/CMP Technology
2022
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Mechanism of metal ions adsorption on PVA brush during post CMP cleaning
Effect of skin layer of PVA brush on static and dynamic contact area during post CMP cleaning
SPIE Photomask Technology+EUVL
Damage-free pinpoint particle removal for EUV pellicle cleaning
Removal Behavior of Sn and Pb Contaminants on EUV mask after EUV Exposure
SEMICON CSTIC
Characterization of ceria and silica particles loading to PVA brush during post-CMP cleaning