발행물
컨퍼런스
2016년도 한국재료학회 춘계학술대회
2016
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다양한 조성 및 물리적 특성을 가진 Glass 기판의 연마 특성 비교
Development of Cu-resin plate for high efficiency Diamond Mechanical Polishing(DMP) process
SC1 process studies for the removal of metal contaminants and particles generated during the Si wafer manufacturing
Surface Preparation and Cleaning Conference 2016
Effect of TMAH cleaning solution for removal of organic particle from Ru surface in EUV mask cleaning
2016 Material Research Society
Effect of Corrosion Inhibitor on Particle Contamination and Removal for Cu CMP Application