2016

,

Relationship between Surface Damage and Particle Removal on Si Wafer during SC1 Cleaning Process for Si Wafer Manufacturing

2016

,

Adsorption and removal of BTA during Cu CMP and post Cu CMP cleaning

2015

,

Effect of 30 nm particle contaminant on the extreme ultraviolet (EUV) mask and megasonic cleaning process for its removal

2015

,

The research on the oxide etching mechanisms using NF3/H2O plasma gas

2015

,

Study for minimization of edge effect during bumping mask fabrication by TMEMM process