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전체 논문

323

231

레이저 충격파 클리닝 공정에 있어 자외선의 영향
박진구
한국레이저가공학회 2004년도 춘계학술발표대회 논문개요집, 2004

232

Chemical Mechanical Planarization of Ruthenium for capacitor bottom electrode in DRAM Technology
박진구
Electrochemical Society Proceeings, 2004

233

Post CMP Cleaning: from Fundamentals to Future Direction
박진구
CMP-MIC, 2004

234

Chemical and Mechanical Characterizations of the PassivationLayer of Copper in Organic Acid Based Slurries and its CMP Performance
박진구, 0, 0, 0, 0
KEY ENGINEERING MATERIALS, 2004

235

3D Numerical Study for a Polishing Behavior on Oxide CMP (Chemical Mechanical Planarization)"
박진구, 0, 0, 0
KEY ENGINEERING MATERIALS, 2004

236

Wafer Cleaning Efficiency by Laser Shock Wave
박진구
Microelectronics and Packaging, 2003

237

Si Wafer Surface Cleaning Using Laser-Induced Shock Wave: A New Dry Cleaning Methodology
박진구, 0, 0, 0, 0
SURFACE & COATINGS TECHNOLOGY, 2003

238

Interaction Forces between Silica Particles and Wafer Surfaces During Cu Chemical Mechanical planarization
박진구, 0, 0
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2003

239

Nano Mold fabrication for imprinting lithography
박진구
Korea Society of Mechanical Technology, 2003

240

Laser Shock Removal of Micro and Nanoscale Particles
박진구
Proceedings of 26th Annual Metting of The Adhesion Society, 2003