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251
Nanotribological and Thermal Characterization of PECVD Fluorocarbon Film as a Highly Hydrophobic and Antiadhesive Layer in Nanofabrication Process
박진구
Pacific RIM workshop on Transducers and Micro/Nano Technologies, 2002
252
Passivation and etching behaviors of copper surface in copper CMP slurries
박진구
5th International Symposium on Chemical Mechanical Polishing, Proceedings for Electrochemical Societ, 2002
253
The Conditioning Behaviors of Diamond CVD Deposited Seramic CMP Conditioner
박진구
한국마이크로전자 및 패키징학회 2002 춘계 기술심포지움 논문집, 2002
254
Etching and Polishing Behavior of Cu Thin Film accoring to the additive chemicals
박진구
한국마이크로전자 및 패키징 학회 2002 춘계 기술심포지움 논문집, 2002
255
Nanotribological Characterization of Annealed Fluorocarcbon Thin Film in N2 and Vacuum
박진구
한국마이크로전자 및 패키징학회 2002 춘계 기술심포지움 논문집, 2002
256
Effect of Organic in Copper Chemical Mechanical Planarization Slurry on Slurry Stability and Particle Contamination on Copper Surfaces
Eom DH, Park JG, Lee ES, 0
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES &, 2002
257
Next Generation Scratch and Corrosion Free Conditioner for Chemical Mechanical Planarization
박진구
7th international CMP-MIC conference proceedings, 2002
258
Regeneration of Used Oxide Slurry and Its Application to Oxide CMP
박진구
7th International CMP-MIC conference proceedings, 2002
259
Recycling of Oxide CMP Slurry using Filter Units
박진구
제9회 한국반도체 학술대회, 2002
260
Si Wafer Surface Cleaning Using Laser-induced Shock Wave : A New Dry Cleaing Methodology
박진구, 0, 0, 0
SURFACE ENGINEERING, 2002
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